Electronic device manufacturing system

ABSTRACT

An electronic device manufacturing system may include a mainframe to which one or more process chambers of different size may be coupled. A different number of process chambers may be coupled to each facet (i.e., side wall) of the mainframe. The process chambers coupled to one facet may be of a different size than process chambers coupled to other facets. For example, one process chamber of a first size may be coupled to a first facet, two process chambers each of a second size different than the first size may be coupled to a second facet, and three process chambers each of a third size different than the first and second sizes may be coupled to a third facet. Other configurations are possible. The mainframe may have a square or rectangular shape. Methods of assembling an electronic device manufacturing system are also provided, as are other aspects.

CROSS REFERENCE TO RELATED APPLICATION

This claims priority to U.S. Provisional Patent Application No.61/882,795, filed Sep. 26, 2013 and entitled “MIXED-PLATFORM APPARATUS,SYSTEMS, AND METHODS FOR SUBSTRATE PROCESSING”, which is herebyincorporated by reference herein for all purposes.

FIELD

The invention relates generally to electronic device manufacturing, andmore particularly to mixed-platform apparatus, systems, and methods forsubstrate processing.

BACKGROUND

Conventional electronic device manufacturing systems may include amainframe around which multiple process chambers and load lock chambersare arranged. The mainframe may have a number of side walls (commonlyreferred to as “facets”) to which a typically equal number of generallyequally-sized process chambers and/or load lock chambers are coupled.For example, a mainframe may have four facets wherein a first facet mayhave two load lock chambers coupled thereto and each of the other threefacets may have two process chambers of generally equal size coupledthereto. Such mainframe configurations are typically provided to allowvarious process chambers and/or load lock chambers to be selectively andinterchangeably arranged around a mainframe. However, the types andsequences of substrate processing that may be performed in an electronicdevice manufacturing system may be limited by such mainframeconfigurations.

Accordingly, apparatus, systems, and methods are needed to provide othersubstrate processing mainframe configurations.

SUMMARY

According to a first aspect, an electronic device manufacturing systemis provided. The electronic device manufacturing system comprises amainframe comprising a transfer chamber and a plurality of facetsdefining side walls of the transfer chamber, each of the plurality offacets configured to couple to one or more process chambers or load lockchambers, each one of the plurality of facets having one or moresubstrate access ports, wherein a first one of the plurality of facetshas a first number of substrate access ports, and a second one of theplurality of facets has a second number of substrate access ports, thesecond number different than the first number.

According to a second aspect, another electronic device manufacturingsystem is provided. The electronic device manufacturing system comprisesa mainframe comprising a transfer chamber and a plurality of facetsdefining side walls of the transfer chamber, a first process chambercoupled to a first one of the plurality of facets, the first processchamber having a first facet-side dimension, and a second processchamber coupled to a second one of the plurality of facets, the secondprocess chamber having a second facet-side dimension different than thefirst facet-side dimension.

According to a third aspect, a method of assembling an electronic devicemanufacturing system is provided. The method comprises providing amainframe comprising a transfer chamber and a plurality of facetsdefining side walls of the transfer chamber, coupling a first chamber toa first one of the plurality of facets, the first chamber having a firstfacet-side dimension, and coupling a second chamber to a second one ofthe plurality of facets, the second chamber having a second facet-sidedimension different than the first facet-side dimension.

Still other aspects, features, and advantages of embodiments of theinvention may be readily apparent from the following detaileddescription wherein a number of example embodiments and implementationsare described and illustrated, including the best mode contemplated forcarrying out the invention. The invention may also include other anddifferent embodiments, and its several details may be modified invarious respects, all without departing from the scope of the invention.Accordingly, the drawings and descriptions are to be regarded asillustrative in nature, and not as restrictive. The invention covers allmodifications, equivalents, and alternatives falling within the scope ofthe invention.

BRIEF DESCRIPTION OF DRAWINGS

The drawings, described below, are for illustrative purposes only andare not necessarily drawn to scale. The drawings are not intended tolimit the scope of this disclosure in any way.

FIG. 1 illustrates a schematic top view of an electronic devicemanufacturing system according to the prior art.

FIG. 2 illustrates a schematic top view of a mixed-platform electronicdevice manufacturing system according to embodiments.

FIGS. 3A-D illustrate simplified, partial, orthographic views of themainframe facets of FIG. 2 according to embodiments.

FIG. 4 illustrates a flowchart of a method of assembling an electronicdevice manufacturing system according to embodiments.

DETAILED DESCRIPTION

Reference will now be made in detail to the example embodiments of thisdisclosure, which are illustrated in the accompanying drawings. Whereverpossible, the same reference numbers will be used throughout thedrawings to refer to the same or like parts.

In one aspect, an electronic device manufacturing system may include amainframe having a transfer chamber and a number of facets that definethe side walls of the transfer chamber. In some embodiments, themainframe may have a square or rectangular shape. One or more load lockchambers may be coupled to one facet of the mainframe, while one or moreprocess chambers may be coupled to each of the other facets of themainframe. The process chambers may perform various substrate processes,and the process chambers coupled to different facets need not be thesame size. Also, each mainframe facet may not be configured to couple toan equal number of process and/or load lock chambers. For example, onefacet may be configured to couple to only one process chamber of a firstsize, a second facet may be configured to couple to two process chamberseach of a second size different than the first size, and so on. One ormore substrate access ports on each facet may interface each of the loadlock and process chambers with the transfer chamber to allow substratesto be transferred there between. The substrate access ports may be sizedand positioned on each facet to accommodate the number and size ofchambers that may be coupled to each facet. Electronic devicemanufacturing systems having such a mainframe may allow a wider varietyand more diverse sequences of substrate processes to be performed in asingle system, thus improving versatility, capability, and/or efficiencyof such electronic device manufacturing systems. In other aspects,methods of assembling an electronic device manufacturing system areprovided, as will be explained in greater detail below in connectionwith FIGS. 1-4.

FIG. 1 illustrates an example of a known electronic device manufacturingsystem 100 in accordance with the prior art. Electronic devicemanufacturing system 100 is configured to process substrates and mayinclude a mainframe 102 having four facets 104 a-d. Mainframe 102 mayinclude a transfer chamber 106 wherein facets 104 a-d may define theside walls of transfer chamber 106. Each of facets 104 a-d may have apair of substrate access ports 105 each configured to allow ahorizontally-oriented substrate 108 to pass there through. Substrate 108may be a semiconductor wafer, glass plate or panel, and/or otherworkpiece used to make electronic devices or circuit components. Eachsubstrate access port 105 may be, e.g., an elongated slot or slit formedin a side wall of transfer chamber 106, and each may include, e.g., aslit valve or other suitable device for opening and closing a substrateaccess port 105.

Each of facets 104 a-d may be coupled to a respective pair of processchambers 110 or load lock chambers 114. Each process chamber 110 andload lock chamber 114 may have a chamber port corresponding to arespective substrate access port 105. Transfer chamber 106, processchambers 110, and/or load lock chambers 114 may each operate at a vacuumpressure. Process chambers 110 may each perform a same or differentprocess on a substrate 108 including, e.g., deposition, oxidation,nitration, etching, polishing, cleaning, lithography, or the like. Otherprocesses may be performed therein.

Mainframe 102 may also include a robot assembly 118 in transfer chamber106. Robot assembly 118 may be configured to transfer one or moresubstrates 108 to and from each process chamber 110 and load lockchamber 114. Load lock chambers 114 may be coupled to a factoryinterface 120, which may be coupled to one or more FOUPs (front openingunified pods) 122. FOUPs 122 may each be a container having a stationarycassette therein for holding multiple substrates. FOUPs 122 may eachhave a front opening interface configured to be used with factoryinterface 120. Factory interface 120 may have a buffer chamber 124 andone or more robot assemblies (not shown) configured to transfersubstrates via linear, rotational, and/or vertical movement betweenFOUPs 122 and load lock chambers 114. Substrates may be transferredbetween FOUPs 122 and load lock chambers 114 in any sequence ordirection. Load lock chambers 114 may each be a batch-type or singlesubstrate-type of load lock chamber. A controller 126 may control robotassembly 118 and/or the operation of electronic device manufacturingsystem 100.

As shown, mainframe 102 typically has a same number of substantiallyequally-sized process chambers 110 coupled to facets 104 a-c, andtypically the same number of load lock chambers 114 coupled to facet 104d as the number of process chambers coupled to each facet 104 a-c.Substrate access ports 105 are also typically the same size, and eachfacet 104 a-d typically has the same number of substrate access ports105. In other known electronic device manufacturing systems, a mainframemay be configured with other equal numbers of chambers coupled to eachfacet, such as, e.g., three load lock chambers coupled to one facet andthree process chambers coupled to each of the other facets. Such knownelectronic device manufacturing systems having generally symmetricmainframe configurations of load lock chambers and process chambers maybe limited as to the types and sequences of substrate processing thatmay be performed in a single electronic device manufacturing system.

FIG. 2 illustrates an electronic device manufacturing system 200 inaccordance with one or more embodiments. Electronic device manufacturingsystem 200 may be configured to process multiple substrates 108concurrently. Electronic device manufacturing system 200 may include amainframe 202 having four facets 204 a-d. Mainframe 202 may include atransfer chamber 206 wherein facets 204 a-d may define the side walls oftransfer chamber 206. Mainframe 202 may have a generally square orrectangular shape. In other embodiments, mainframe 202 may have othersuitable shapes and/or numbers of facets.

In some embodiments, facet 204 a may have a pair of substrate accessports 205 a, facet 204 b may have three substrate access ports 205 b(only one is labeled), facet 204 c may have one substrate access port205 c, and facet 204 d may have three substrate access ports 205 d (ofwhich two are labeled). Each of substrate access ports 205 a-d isconfigured to allow a horizontally-oriented substrate 108 to pass therethrough. Each of substrate access ports 205 a-d may be, e.g., anelongated slot or slit formed in a side wall of transfer chamber 206.Substrate access ports 205 a-d may each include a slit valve configuredto open and close a substrate access port 205 a-d. Slit valves may be ofany suitable conventional construction, such as, e.g., L-motion slitvalves. Other suitable devices may be used for opening and closingsubstrate access ports 205 a-d.

Each of substrate access ports 205 a-d may be of a different size. Forexample, as shown in FIGS. 3A-3D, each substrate access port 205 a mayhave a width W305 a, each substrate access port 205 b may have a widthW305 b, and substrate access port 205 c may have a width W305 c. WidthW305 a may be different than width W305 b, and width W305 c may bedifferent than width W305A and different than width W305 b. Eachsubstrate access port 205 d, labeled 305 d 1-d 6 in FIG. 3D (anddescribed further below in connection with load lock chambers 214, 215,and 216), may each have a width W305 d, which may be the same as ordifferent than width W305 b. The width of each substrate access port 205a-d is at least wide enough to allow a substrate 108 to pass therethrough. The different sizes of substrate access ports may allow robotassembly 218 to reach different areas within a chamber coupled to one offacets 204 a-d. In some embodiments wherein a facet has two or moresubstrate access ports, the substrate access ports may not be laterallycentered in a facet and/or equidistantly spaced from each other asshown, e.g., in FIGS. 3A and 3B. In some embodiments wherein a facet hasa single substrate access port, that substrate access port may belaterally centered in the facet or offset as shown, e.g., in FIGS. 2 and3C.

In other embodiments, each of facets 204 a-d may have other numbers,sizes, and/or combinations of substrate access ports than those shown inFIGS. 2 and 3A-3D, provided the width of a facet is suitable foraccommodating those numbers, sizes, and/or combinations of substrateaccess ports. For example, in some embodiments, facet 204 b may have onesubstrate access port 205 c instead of three substrate access ports 205b. In other embodiments, one facet may have one substrate access port205A and one substrate access port 205 b, while another facet may haveone substrate access port 205 b and one substrate access port 205 c.Various combinations of substrate access ports may be possible providedthe facet has a suitable width. This allows a mainframe 202 to becustomized for coupling to specific types and numbers of desired processand load lock chambers, as now described.

Returning to FIG. 2, each of facets 204 a-d may be coupled to one ormore process chambers or load lock chambers. Transfer chamber 206 andeach process chamber and load lock chamber may operate at a vacuumpressure. In some embodiments, each process chamber may represent adifferent stage or phase of substrate processing. In other embodiments,two or more process chambers may perform the same process for concurrentsubstrate processing to improve substrate throughput in electronicdevice manufacturing system 200.

In some embodiments, facet 204 a may be coupled to a pair of processchambers 210, which may be similar or identical to process chambers 110.Process chambers 210 may each be substantially the same size and mayeach perform a same or different substrate process, such as, e.g.,etching, chemical vapor deposition, or physical vapor deposition. Otherprocesses may be performed by one or both of process chambers 210.Process chambers 210 may each have a chamber port corresponding to arespective substrate access port 205 a. Process chambers 210 may eachhave a facet-side dimension that, in some embodiments, may be a widthW204 a of process chamber 210 (labeled in only one process chamber 210).In some embodiments, width W204 a may be, e.g., about 1.2 meters. Thefacet-side dimension may alternatively be width W305 a (FIG. 3A), whichmay correspond to a chamber port width of process chamber 210.

In some embodiments, facet 204 b may be coupled to a process chamber211. Process chamber 211 may be a three pedestal chamber (that is, mayreceive up to three substrates 108 for concurrent processing). Processchamber 211 may have three chamber ports corresponding respectively tothe three substrate access ports 205 b. Process chamber 211 may have afacet-side dimension that, in some embodiments, may be a width W204 b ofprocess chamber 211. In some embodiments, width W204 b may be, e.g.,about 2.4 meters, wherein the width of facet 204 b may also be at leastabout 2.4 meters. The facet-side dimension of process chamber 211 mayalternatively be a width W305 b (FIG. 3B), which may correspond to achamber port width of process chamber 211. In some embodiments, processchamber 211 may be a DSM (dielectric systems and modules) chamber.Process chamber 211 may be any other suitable type of process chamber.

In alternative embodiments, facet 204 b may be coupled to three processchambers (as illustrated by phantom lines dividing process chamber 211into three process chambers 211 a, 211 b, and 211 c). In suchalternative embodiments, each one of the three process chambers 211 a,211 b, and 211 c may have a facet-side dimension that may be aboutone-third of width W204 b, which in some embodiments, may be about 800mm. The facet-side dimension of each process chamber 211 a, 211 b, and211 c may alternatively be width W305 b (FIG. 3B), which may correspondto a chamber port width of process chamber 211 a, 211 b, and 211 c. Eachof the three process chambers 211 a, 211 b, and 211 c may perform a sameor different substrate process.

In some embodiments, facet 204 c may be coupled to a process chamber212. Process chamber 212 may be larger than process chambers 210 and/or211 and may have a chamber port corresponding to substrate access port205 c. Process chamber 212 may have a facet-side dimension that, in someembodiments, may be a width W204 c of process chamber 212. In someembodiments, width W204 c may be greater than about 1.2 meters and lessthan the width of facet 204 c, which in some embodiments may be about2.4 meters. The facet-side dimension of process chamber 212 mayalternatively be a width W305 c (FIG. 3B), which may correspond to achamber port width of process chamber 212. In some embodiments, processchamber 212 may be an epitaxial chamber. In other embodiments, processchamber 212 may be any suitable type of process chamber.

In some embodiments, facet 204 d may be coupled to load lock chambers214, 215, and 216. Load lock chambers 214, 215, and 216 may each be abatch-type or single substrate-type of load lock chamber. In someembodiments, load lock chamber 214 may be a stacked load lock chamber,load lock chamber 215 may be a triple-stacked load lock chamber, andload lock chamber 216 may be a single volume load lock chamber. Each ofload lock chambers 214, 215, and 216 may have one or more chamber portscorresponding to a respective substrate access port 205 d. For example,as shown in FIG. 3D, stacked load lock chamber 214, which may have twoseparate substrate volumes, may have two vertically-aligned chamberports corresponding respectively to substrate access ports 305 d 1 and305 d 2. Triple-stacked load lock chamber 215, which may have threeseparate substrate volumes, may have three vertically-aligned chamberports corresponding to substrate access ports 305 d 3, 305 d 4, and 305d 5, respectively. And single volume load lock chamber 216 may have asingle chamber port corresponding to substrate access port 305 d 6. Inother embodiments, any one or more of load lock chambers 214, 215,and/or 216 may be a stacked load lock chamber, a triple-stacked loadlock chamber, and/or a single volume load lock chamber. Also, in someembodiments, any one or more of load lock chambers 214, 215, and/or 216may be a process-capable chamber. That is, any one or more of load lockchambers 214, 215, and/or 216, or any one of the volumes locatedtherein, may be capable of performing a substrate pre-heating,abatement, or cooling process.

Mainframe 202 may also include a robot assembly 218 in transfer chamber206. Robot assembly 218 may be configured to transfer one or moresubstrates 108 to and from each process chamber 210, 211 (alternatively211 a-c), and 212 and each load lock chamber 214, 215, and 216. Robotassembly 218 may be configured to transfer substrates 108 from any onechamber directly to any other chamber of mainframe 202. In someembodiments, substrates 108 may be transferred by robot assembly 218 inany sequence or direction. In some embodiments, robot assembly 218 mayhave dual transport blades each independently projectable andretractable to and from any chamber of mainframe 202, thus increasingsystem throughput by enabling concurrent substrate transfers. In someembodiments, robot assembly 218 may have only a single transport bladeand/or may be a SCARA (selective compliance articulated robot arm)robot. Alternatively, robot assembly 218 may be any suitable mechanismfor transferring substrates between the chambers of mainframe 202.

In some embodiments, process chambers 210, 211 (alternatively 211 a-c),and 212 may be positioned relative to each other in order to minimizemotion of robot assembly 218 and thus transfer time of substrates 108moving from one chamber to the next. Such positioning may increasesubstrate throughput and improve yield by reducing the time betweensubsequent processes and the likelihood of particle contamination duringsubstrate transfers.

Load lock chambers 214, 215, and 216 may be coupled to a factoryinterface 220 and may provide a first vacuum interface between factoryinterface 220 and transfer chamber 206. In some embodiments, each ofload lock chambers 214, 215, and 216 may increase substrate throughputby alternately communicating with transfer chamber 206 and factoryinterface 220. That is, while one load lock chamber 214, 215, or 216, orany one volume of a stacked or triple-stacked load lock chamber,communicates with transfer chamber 206, the other load lock chambers214, 215, or 216, or the other volumes of a stacked or triple-stackedload lock chamber, may communicate with factory interface 220. Substratetransfers between factory interface 220, load lock chambers 214, 215, or216, and transfer chamber 206 may be made in any other suitable manner.

Factory interface 220 may be coupled to one or more FOUPs (front openingunified pods) 222. FOUPs 222 may each be a container having a stationarycassette therein for holding multiple substrates. FOUPs 222 may eachhave a front opening interface configured to be used with factoryinterface 220. In other embodiments, any suitable type of pod and/orload port may be used instead of FOUPs 222. Factory interface 220 mayhave a buffer chamber 224 and one or more robot assemblies (not shown)configured to transfer substrates via linear, rotational, and/orvertical movement between FOUPs 222 and load lock chambers 214, 215, and216. Substrates may be transferred between FOUPs 222 and load lockchambers 214, 215, and 216 in any sequence or direction.

Electronic device manufacturing system 200 may have other suitablenumbers of FOUPs 222 and/or load lock chambers. In some embodiments, thenumber of load lock chambers coupled to facet 204 d may be independentof the number of process chambers coupled to any one of facets 204 a-c.For example, the number of load lock chambers may be different than thehighest number of process chambers coupled to a facet. Also, in someembodiments, up to four process chambers may be coupled to a singlefacet, depending on the size of mainframe 202 relative to the size(s) ofthe four process chambers. In some embodiments, mainframe 202 may nothave a chamber coupled to each chamber position located on facets 204a-d.

A controller 226 may control the processing and transferring ofsubstrates 108 in and through electronic device manufacturing system200. Controller 226 may be, e.g., a general purpose computer and/or mayinclude a microprocessor or other suitable CPU (central processingunit), a memory for storing software routines that control electronicdevice manufacturing system 200, input/output peripherals, and supportcircuits (such as, e.g., power supplies, clock circuits, circuits fordriving robot assembly 218, a cache, and/or the like). Controller 226may be programmed to, e.g., process one or more substrates sequentiallythrough each of process chambers 210, 211 (alternatively 211 a-c), and212. In other embodiments, controller 226 may be programmed to process asubstrate in any desired order through process chambers 210, 211(alternatively 211 a-c), and 212. In still other embodiments, controller226 may be programmed to skip and/or repeat processing of one or moresubstrates in one or more process chambers 210, 211 (alternatively 211a-c), and 212. Controller 226 may alternatively be programmed to processone or more substrates in electronic device manufacturing system 200 inany suitable manner.

In some embodiments, two electronic device manufacturing systems 200 maybe clustered. That is, one facet of each mainframe 202, such as, e.g., afacet 204 b of a first mainframe 202 and a facet 204 d of a secondmainframe 202, may be coupled to the same pass-through chamber fortransferring substrates between the two electronic device manufacturingsystems 200. This may further enhance the versatility, capability,and/or efficiency of such electronic device manufacturing systems.

FIG. 4 illustrates a method 400 of assembling an electronic devicemanufacturing system in accordance with one or more embodiments. Atprocess block 402, method 400 may include providing a mainframe having atransfer chamber and a plurality of facets that define side walls of thetransfer chamber. For example, the mainframe may be mainframe 202 ofFIG. 2 having facets 204 a-d that define the side walls of transferchamber 206.

At process block 404, a first chamber may be coupled to a first facet ofthe mainframe. The first chamber may have a first facet-side dimension.The first facet-side dimension may be, e.g., a facet-side width of thechamber or a width of a substrate access port for the first chamber. Insome embodiments, the first chamber may be, e.g., a process chamber 210coupled to facet 204 a, and the first facet-side dimension may be widthW204 a of process chamber 210 or width W305 a of substrate access port205 a.

At process block 406, method 400 may include coupling a second chamberto a second facet of the mainframe. The second chamber may have a secondfacet-side dimension different than the first facet-side dimension. Thesecond facet-side dimension may be, e.g., a facet-side width of thechamber or a width of a substrate access port for the second chamber. Insome embodiments, the second chamber may be, e.g., process chamber 212coupled to facet 204 c, and the second facet-side dimension may be widthW204 c of process chamber 212 or width W305 c of substrate access port205 c.

The above process blocks of method 400 may be executed or performed inan order or sequence not limited to the order and sequence shown anddescribed. For example, in some embodiments, process block 404 may beperformed after or simultaneously with process block 406.

Persons skilled in the art should readily appreciate that theembodiments of the invention described herein is susceptible of broadutility and application. Many embodiments and adaptations of theinvention other than those described herein, as well as many variations,modifications, and equivalent arrangements, will be apparent from, orreasonably suggested by, the invention and the foregoing descriptionthereof, without departing from the substance or scope of the invention.For example, although an example mixed-platform electronic devicemanufacturing system is shown in FIG. 2, other suitable configurationsof mixed-platform process and load lock chambers may be used inelectronic device manufacturing systems in accordance with one or moreembodiments of the invention. Accordingly, while the invention has beendescribed herein in detail in relation to specific embodiments, itshould be understood that this disclosure is only illustrative andpresents examples of the invention and is made merely for purposes ofproviding a full and enabling disclosure of the invention. Thisdisclosure is not intended to limit the invention to the particularapparatus, devices, assemblies, systems, or methods disclosed, but, tothe contrary, the intention is to cover all modifications, equivalents,and alternatives falling within the scope of the invention.

What is claimed is:
 1. An electronic device manufacturing system,comprising: a mainframe comprising a transfer chamber and a plurality offacets defining side walls of the transfer chamber, each of theplurality of facets configured to couple to one or more process chambersor load lock chambers, the plurality of facets having one or moresubstrate access ports directly on the mainframe; wherein: a first oneof the plurality of facets has a first number of the substrate accessports; and a second one of the plurality of facets has a second numberof the substrate access ports, the second number of the substrate accessports different than the first number of the substrate access ports. 2.The electronic device manufacturing system of claim 1, wherein a thirdone of the plurality of facets has a third number of substrate accessports, the third number different than the first number and differentthan the second number.
 3. The electronic device manufacturing system ofclaim 1, wherein a first one of the substrate access ports of a firstone of the plurality of facets has a first size, and a second one of thesubstrate access ports of a second one of the plurality of facets has asecond size, the second size different than the first size.
 4. Theelectronic device manufacturing system of claim 3, wherein a third oneof the substrate access ports of a third one of the plurality of facetshas a third size, the third size different than the first size anddifferent than the second size.
 5. The electronic device manufacturingsystem of claim 1 wherein each one of the substrate access portscomprises a slit valve.